Multibeam’s Multicolumn Electron Beam Lithography (MEBL) Systems are integrated with Synopsys CATS data preparation software, creating an easier and faster path from chip design to production. 

Using electron beams to produce patterns on silicon wafers, e-beam lithography enables faster yield ramp since there is no need to wait for a mask to be manufactured. Additionally, more efficient cycles of learning are realized given the ability to pattern design iterations across a single wafer.