PRODUCTS
MEBL PLATFORM
Out of the Lab and Into the Fab!
Multi Electron Beam Lithography (MEBL) Systems
for productive, high volume manufacturing
for productive, high volume manufacturing
FULLY AUTOMATED
MEBL’s staged vacuum transfer system assures precise, repeatable performance for use in state-of-the-art semiconductor fabs
E-BEAM PRECISION ON A
FAB WORTHY SYSTEM
E-BEAM PRECISION ON A FAB WORTHY SYSTEM
10x-1000x more productive than conventional e-beam
10x higher resolution than laser direct write
Patented multicolumn e-beam array
Multi-chamber, ultra high vacuum, cluster tool
10x higher precision than laser direct write
COMPACT FOOTPRINT
Efficient use of cleanroom and subfab space using cluster tool