PRODUCT
MB PLATFORM
Out of the Lab and Into the Fab!
Features & Specifications
FULLY AUTOMATED
Multibeam’s staged vacuum transfer system assures precise, repeatable performance for use in state-of-the-art semiconductor fabs.
- Compliant with SEMI SECS/GEM
- Multi-module capability (Up to 3x writing modules)
- Self-contained internal isolation systems: vibration, EMI, temperature, etc.
E-BEAM PRECISION ON A
FAB-WORTHY SYSTEM
E-BEAM PRECISION ON A FAB WORTHY SYSTEM
10x-1000x more productive than conventional e-beam
Efficient use of cleanroom and subfab space using cluster tool
10x higher resolution than laser direct write
Patented multicolumn e-beam array
Multi-chamber, ultra high vacuum, cluster tool
10x higher precision than laser direct write
Compact and Competitive
Compact and Competitive
MEBL offers a comparatively small litho system despite its high productivity, fitting within a 30.6m² footprint. The MEBL fits easily into almost any fab.
Multibeam systems are also designed to be modular and can accommodate two additional process modules to achieve desired throughput. Chip producers can have the freedom of choice to meet their production needs.