World's First
Ai-Powered Multicolumn E-Beam
Lithography Platform
10x
higher resolution than laser direct write
<0.1%
millimeter precision from vacuum system
12,000+
rapid prototypes created in testing
We provide chipmakers with what they need - hardware, software and services – to produce patterns on silicon through direct-write lithography.
Multicolumn Electron Beam Lithography
Multibeam's (MEBL) System
Multibeam’s cutting-edge e-beam lithography system is designed to meet the demands of modern microelectronics fabrication. Offering unparalleled precision and speed, it enables the production of advanced integrated circuits with sub-10nm resolution. This innovative technology allows manufacturers to scale up production while maintaining the highest standards of accuracy, ensuring the future of semiconductors is both efficient and reliable.
PAST IS PROLOGUE
Founder and CEO Dr. David K. Lam
“I am grateful for the opportunities to advance chip making technologies in the semiconductor industry. From founding Lam Research in 1980 to develop a single-wafer, cassette-to-cassette, digital-controlled plasma etch system – to now leading development of Multibeam’s MB platform to deliver a high- productivity, direct-writing maskless system using multiple miniature e-beam columns- I have never been
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products Multibeam Corporation 3951 Burton Drive Santa Clara, CA 95054, U.S.A.