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Multibeam will be presenting “High-Productivity Direct Write E-beam Accelerates Early Concept Prototyping and High Mix Production of Trusted and Assured Microelectronics”

SkyWater Technology and Multibeam Corporation Form
Partnership to Deploy Multibeam’s Innovative MEBL System

SkyWater Technology and Multibeam Corporation Form Partnership to Deploy Multibeam’s Innovative MEBL System Advanced lithography technology to serve as a key enabler for SkyWater’s domestic foundry roadmap to 45 nm SANTA CLARA, CA|BLOOMINGTON, MN – November 18, 2020SkyWater Technology,the trusted technology realization partner, and Multibeam Corporation, the maskless lithography technology leader, today disclosed a partnership …

SkyWater Technology and Multibeam Corporation Form
Partnership to Deploy Multibeam’s Innovative MEBL System
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Multibeam Unveils Major Initiative to Develop Full-Wafer, All-Maskless Patterning at 45nm and Larger Nodes on Its MEBL Production System

Multibeam Unveils Major Initiative to Develop Full-Wafer, All-Maskless Patterning at 45nm and Larger Nodes on Its MEBL Production System $38 Million DoD Contract Awarded to Multibeam to Develop New MEBL Application SANTA CLARA, CA – September 10, 2020Multibeam Corporation todayconfirmed it has embarkedupon an ambitious project to apply its innovative Multicolumn E-Beam Lithography (MEBL) technology …

Multibeam Unveils Major Initiative to Develop Full-Wafer, All-Maskless Patterning at 45nm and Larger Nodes on Its MEBL Production System Read More »

Security Lithography

Security Lithography MARCH 3RD, 2020 – BY: MARK LAPEDUS At the recent SPIE Advanced Lithography conference, Multibeam disclosed more details about its efforts to develop multi-beam direct-write lithography for chip security applications. David Lam, chief executive and chairman of Multibeam, described how multi-beam lithography can be used to help thwart IC counterfeiting and tampering in …

Security Lithography Read More »