Multibeam News  
March 2020
Multibeam disclosed more details about its efforts to develop multi-beam direct-write lithography
February 2020
David K. Lam to unveil "Security Lithography" advances to thwart IC
Counterfeiting at SPIE Lithography Conference
October 2019
Multibeam unveils anti-counterfeit IC initiative funded by new contract
July 2018
Technology roadmap disclosed at litho and device security workshops
January 2018
Patent enhances precision direct etch
November 2017
Multibeam patent improves accuracy
September 2017
Dr. David K Lam presented at the
IoT Device Security Summit
July 2017
Dr. David K Lam presented at Semicon
May 2017
Multibeam secures $35M defense contract to build E-Beam System
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Dr. David K. Lam, Chairman & CEO

Multibeam Corporation is a leading electron-beam technology innovator. With 30+ U.S. patents issued, the Silicon Valley pacesetter focuses on developing multicolumn e-beam systems and platforms for four major applications: Complementary E-Beam Lithography (CEBL), Direct Electron Writing (DEW), Direct Deposition/Etch (DDE), and E-Beam Inspection (EBI).

Multibeam ChipLock™ DEW Systems embed security information in each IC including chip ID, communication address, and private key encryption. The chip ID guards against counterfeiting and enables supply chain traceability while encryption keys are crucial in authenticating software. IC-embedded security complements software security and extends from IoT to other ICs that populate automobiles, power grids, manufacturing plants, communication networks, transportation networks, and other critical infrastructure.

Multibeam Pilot™ CEBL Systems work in a hybrid mode with 193nm ArF immersion (193i) lithography to pattern cuts (of lines in "lines-and-cuts" layout) and holes (i.e., contacts and vias) with no masks. Pilot™ CEBL complements 193i and eliminates the soaring costs associated with optical multi-patterning in the manufacture of advanced ICs. Further, because Pilot™ CEBL is followed by Etch, the CEBL-Etch sequence can seamlessly incorporate multicolumn EBI. With feedback and feedforward as well as die-to-database comparison, the CEBL-Etch-EBI integrated process greatly accelerates yield ramp.

Based in Santa Clara, California, Multibeam is led by Dr. David K. Lam, the founder and first CEO of Lam Research who successfully guided the development and market penetration of his eponymous company's first fully automated plasma etch system. Widely recognized as a key contributor to the growth of the semiconductor industry, Dr. Lam was inducted into the Silicon Valley Engineering Hall of Fame in 2013.

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